1. Apparatus for low-energy ion beam deposition & surface analysis

・working pressure：〜10^-８Ｐａ

・low energy ion beam deposition line

  with mass analyzer

・sample exchange sub-chamber

・manipulator

・surface analysis tecniques：

　low energy electron diffraction (LEED)

　low energy ion scattering spectrometry  (LEISS)

　

2.Apparatus for thin film fabrication by low pressure plasma sputtering

3.Apparatus for carbon film fabrication by the low pressure columnar plasma CVD

　

　

　・Columnar plasma

　・Plasma excitation : source gas pressure 6×10^-2〜4×10^-1Pa